Photomask and X-ray mask technology IV

17-18 April, 1997, Kawasaki, Japan

저자

Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering.

출판사

SPIE

출간

1997

쪽수

504쪽

언어

영어

ISBN

9780819425164