Photomask and next-generation lithography mask technology XIV

17-19 April 2007, Yokohama, Japan

저자

Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.

출판사

SPIE

출간

2007

언어

영어

ISBN

9780819467454